Atomfair 4N High Purity Zirconium Oxide (ZrO2) Sputtering Target with 5.4% Yttrium Oxide (Y2O3) Doping – 3 mol%

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This high-purity 99.99% (4N) zirconium oxide sputtering target is doped with 5.4% yttrium oxide (3 mol%) for enhanced stability and performance. Ideal for thin film deposition applications in semiconductor and optical coatings. Available in various diameters with optional copper backing for improved heat dissipation.

SKU: AFMSBZIV934
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Description

This high-purity 99.99% (4N) zirconium oxide sputtering target is doped with 5.4% yttrium oxide (3 mol%) for enhanced stability and performance. Ideal for thin film deposition applications in semiconductor and optical coatings. Available in various diameters with optional copper backing for improved heat dissipation.

Configuration Diameter (mm) Thickness (mm) Backing Packing
ZrO2 + 5.4% Y2O3 50.8 3 None 1 pc per pack
ZrO2 + 5.4% Y2O3 50.8 3 2mm Copper 1 pc per pack
ZrO2 + 5.4% Y2O3 60 3 None 1 pc per pack
ZrO2 + 5.4% Y2O3 60 3 2mm Copper 1 pc per pack
ZrO2 + 5.4% Y2O3 76.2 3 None 1 pc per pack
ZrO2 + 5.4% Y2O3 76.2 3 2mm Copper 1 pc per pack

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