Description
This high-purity Molybdenum Trioxide (MoO3) sputtering target is ideal for thin film deposition applications. With 99.9% purity and various size options, it ensures consistent performance in research and industrial processes. Available in standard and copper-backed configurations for different sputtering system requirements.
| Diameter (mm) | Thickness (mm) | Configuration | Packing |
|---|---|---|---|
| 25.4 | 3 | Standard | 1 pc |
| 25.4 | 3 | Bonded with 1mm copper backing | 1 pc |
| 25.4 | 4-6 | Standard | 1 pc |
| 50 | 3 | Standard | 1 pc |
| 50 | 3 | Bonded with 1mm copper backing | 1 pc |
| 50 | 4-6 | Standard | 1 pc |
| 50.8 | 3 | Standard | 1 pc |
| 50.8 | 3 | Bonded with 1mm copper backing | 1 pc |
| 50.8 | 4-6 | Standard | 1 pc |
| 60 | 3 | Standard | 1 pc |
| 60 | 3 | Bonded with 1mm copper backing | 1 pc |
| 60 | 4-6 | Standard | 1 pc |
| 76.2 | 3-4 | Standard | 1 pc |
| 76.2 | 3-4 | Bonded with 2mm copper backing (total thickness ≤5mm) | 1 pc |
| 80 | 3 | Standard | 1 pc |
| 80 | 3 | Bonded with 1mm copper backing | 1 pc |
| 80 | 4-6 | Standard | 1 pc |
| 101.6 | 3-6 | Standard | 1 pc |
| 101.6 | 3 | Bonded with 2mm copper backing | 1 pc |
If you are interested or have any questions, please contact us at inquiry@atomfair.com
Disclaimer: Sold exclusively for laboratory research.
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