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Atomfair High Purity Molybdenum Trioxide (MoO3) Sputtering Target – 99.9% (3N) Pure

This high-purity Molybdenum Trioxide (MoO3) sputtering target is ideal for thin film deposition applications. With 99.9% purity and various size options, it ensures consistent performance in research and industrial processes. Available in standard and copper-backed configurations for different sputtering system requirements.

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Description

This high-purity Molybdenum Trioxide (MoO3) sputtering target is ideal for thin film deposition applications. With 99.9% purity and various size options, it ensures consistent performance in research and industrial processes. Available in standard and copper-backed configurations for different sputtering system requirements.

Diameter (mm) Thickness (mm) Configuration Packing
25.4 3 Standard 1 pc
25.4 3 Bonded with 1mm copper backing 1 pc
25.4 4-6 Standard 1 pc
50 3 Standard 1 pc
50 3 Bonded with 1mm copper backing 1 pc
50 4-6 Standard 1 pc
50.8 3 Standard 1 pc
50.8 3 Bonded with 1mm copper backing 1 pc
50.8 4-6 Standard 1 pc
60 3 Standard 1 pc
60 3 Bonded with 1mm copper backing 1 pc
60 4-6 Standard 1 pc
76.2 3-4 Standard 1 pc
76.2 3-4 Bonded with 2mm copper backing (total thickness ≤5mm) 1 pc
80 3 Standard 1 pc
80 3 Bonded with 1mm copper backing 1 pc
80 4-6 Standard 1 pc
101.6 3-6 Standard 1 pc
101.6 3 Bonded with 2mm copper backing 1 pc

If you are interested or have any questions, please contact us at inquiry@atomfair.com

Disclaimer: Sold exclusively for laboratory research.

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