Description
Premium 99.5% pure Tantalum Nitride (TaN) sputtering targets for high-performance thin film deposition applications. Available in various diameters and thicknesses, with optional copper backing for enhanced thermal conductivity. Ideal for semiconductor, optical, and industrial coating processes.
| Product Name | Specification | Packing | Pack Size |
|---|---|---|---|
| Tantalum Nitride (TaN) Target | 99.5% purity, Ø50.8×2mm | Piece | 1 |
| Tantalum Nitride (TaN) Target | 99.5% purity, Ø50.8×3mm | Piece | 1 |
| Tantalum Nitride (TaN) Target with Copper Backing | 99.5% purity, Ø50.8×3mm bonded to 2mm copper plate | Piece | 1 |
| Tantalum Nitride (TaN) Target | 99.5% purity, Ø50.8×4mm | Piece | 1 |
| Tantalum Nitride (TaN) Target with Copper Backing | 99.5% purity, Ø50.8×4mm bonded to 2mm copper plate | Piece | 1 |
| Tantalum Nitride (TaN) Target | 99.5% purity, Ø60×3mm | Piece | 1 |
| Tantalum Nitride (TaN) Target with Copper Backing | 99.5% purity, Ø60×3mm bonded to 2mm copper plate | Piece | 1 |
| Tantalum Nitride (TaN) Target | 99.5% purity, Ø60×4mm | Piece | 1 |
| Tantalum Nitride (TaN) Target with Copper Backing | 99.5% purity, Ø60×4mm bonded to 2mm copper plate | Piece | 1 |
If you are interested or have any questions, please contact us at inquiry@atomfair.com
Disclaimer: Sold exclusively for laboratory research.
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