Rapid vaccine formulation for immediate pandemic response employing silicon photonics co-integration
pandemic response
silicon photonics
vaccine development
biosensing
rapid diagnostics
Nanoscale heat dissipation in carbon nanotube vias for 3D integrated circuits
carbon nanotubes
thermal management
3D ICs
semiconductor reliability
joule heating
Preparing for 2032 processor nodes with quantum-resistant cryptographic algorithms
processor nodes
quantum-resistant cryptography
post-quantum security
semiconductor trends
encryption
Employing ruthenium interconnects for next-generation semiconductor energy efficiency
ruthenium interconnects
semiconductor scaling
energy-efficient computing
advanced metallization
chip design
Employing germanium-silicon strain engineering for next-generation photonic devices
germanium-silicon
strain engineering
photonics
optoelectronics
semiconductor devices
Using ferroelectric hafnium oxide for ultra-low-power non-volatile memory devices
ferroelectric materials
hafnium oxide
non-volatile memory
energy efficiency
semiconductor technology
Using atomic layer etching for precise fabrication of 2nm semiconductor nodes
atomic layer etching
semiconductor fabrication
2nm nodes
nanomanufacturing
chip scaling
Via computational lithography optimizations for 0.7nm semiconductor node patterning
computational lithography
semiconductor scaling
AI optimization
quantum effects
chip fabrication
Employing germanium-silicon strain engineering for high-performance quantum dot devices
strain engineering
germanium-silicon
quantum dots
heterostructures
semiconductor devices
Using carbon nanotube vias for next-generation 3D integrated circuit cooling
carbon nanotubes
thermal management
3D ICs
semiconductor cooling
nanoelectronics
Through EUV mask defect mitigation via AI-driven pattern correction for 2nm chips
EUV lithography
mask defects
AI correction
semiconductor manufacturing
2nm technology
Employing ruthenium interconnects for next-generation semiconductor miniaturization
ruthenium interconnects
semiconductor scaling
resistivity
electromigration
advanced nodes