Advanced semiconductor and nanotechnology development

At spin relaxation timescales in quantum dot qubits for fault-tolerant computing

spin relaxation quantum dots qubit coherence fault-tolerant computing semiconductor physics

Via directed self-assembly of block copolymers: Scalable nanotemplates for 2032 processor nodes

block copolymers nanolithography semiconductor scaling self-assembly Moore's Law

Through hybrid bonding for chiplet integration in quantum-classical processors

hybrid bonding chiplet integration quantum computing 3D packaging heterogeneous systems

Investigating spin relaxation timescales in quantum dot qubits for fault-tolerant computing

spin relaxation quantum dots qubits fault-tolerant computing coherence time

Optimizing hybrid bonding techniques for chiplet integration in next-gen processors

hybrid bonding chiplet integration interconnects 3D packaging semiconductor scaling

Harnessing quantum vacuum fluctuations for ultra-low-energy nanoscale device operation

quantum vacuum fluctuations nanoscale devices energy efficiency Casimir effect quantum electronics

Mitigating EUV mask defects through self-healing nanoparticle coatings

EUV lithography mask defects self-healing coatings nanoparticles semiconductor fabrication

Preparing for 2032 processor nodes with neuromorphic error correction techniques

neuromorphic computing processor nodes error correction semiconductor scaling 2032 technology

Uniting glacier physics with semiconductor design for cryogenic computing efficiency

cryogenics glacier modeling thermal management quantum computing materials science

Using atomic layer etching for 2nm nodes in semiconductor fabrication

atomic layer etching semiconductor manufacturing 2nm technology nanofabrication Moore's Law

Exploring hybrid bonding techniques for scalable chiplet integration in next-gen computing

hybrid bonding chiplet integration 3D packaging semiconductor manufacturing interconnect technology

Through EUV mask defect mitigation using AI-driven pattern correction

EUV lithography mask defects AI correction semiconductor manufacturing nanofabrication