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Atomfair High Purity 99.9% Vanadium Dioxide (VO2) Sputtering Target with Optional Copper Backing
High purity 99.9% (3N) Vanadium Dioxide (VO2) sputtering targets for thin film deposition applications. Available in various diameters and thicknesses, with optional copper backing for enhanced thermal conductivity. May contain trace phases of V2O3 and V2O5 as impurities.
Description
High purity 99.9% (3N) Vanadium Dioxide (VO2) sputtering targets for thin film deposition applications. Available in various diameters and thicknesses, with optional copper backing for enhanced thermal conductivity. May contain trace phases of V2O3 and V2O5 as impurities.
| Configuration | Dimensions | Purity | Packaging |
|---|---|---|---|
| Standard VO2 Target | ฯ60ร3mm | 99.9% (may contain V2O3/V2O5 phases) | 1 piece per pack |
| Copper-Backed VO2 Target | ฯ60ร3mm (VO2) + 2mm Cu backing | 99.9% (may contain V2O3/V2O5 phases) | 1 piece per pack |
| Standard VO2 Target | ฯ75ร6mm | 99.9% (may contain V2O3/V2O5 phases) | 1 piece per pack |
If you are interested or have any questions, please contact us at inquiry@atomfair.com
Disclaimer: Sold exclusively for laboratory research.
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