Advanced semiconductor and nanotechnology development

Through plasma-enhanced atomic layer deposition for next-generation semiconductor fabrication

semiconductor fabrication atomic layer deposition plasma-enhanced processes nanomanufacturing thin-film growth

At terahertz oscillation frequencies for next-generation wireless communication networks

terahertz waves 6G networks photonics semiconductor devices atmospheric absorption

Mitigating self-heating effects in 3nm semiconductor nodes through advanced thermal materials

3nm nodes self-heating mitigation thermal management semiconductor cooling nanoelectronics

With albedo-modifying urban materials using gate-all-around nanosheet transistors

albedo modification urban materials nanosheet transistors smart coatings thermal regulation

Through EUV mask defect mitigation in yoctogram mass measurements

EUV lithography mask defects yoctogram mass spectrometry nanofabrication

Achieving picometer precision in EUV mask defect mitigation via self-assembling monolayers

EUV lithography mask defects self-assembly monolayers semiconductor manufacturing atomic precision

Optimizing atomic layer etching for 2nm semiconductor nodes with plasma precision control

atomic layer etching 2nm nodes plasma control semiconductor fabrication precision etching

Integrating glacier physics with semiconductor design for energy-efficient cooling systems

glacier dynamics semiconductor cooling thermal management energy efficiency microelectronics

Investigating self-heating mitigation strategies in 3nm semiconductor nodes for improved thermal management

semiconductor thermal management 3nm nodes self-heating mitigation transistor reliability advanced cooling

Preparing for 2032 processor nodes with advanced lithography techniques

lithography semiconductor transistor scaling EUV chip fabrication

Through lights-out production to achieve zero-defect manufacturing in semiconductor fabs

lights-out production semiconductor manufacturing automation defect reduction Industry 4.0

Optimizing 2nm semiconductor fabrication using atomic layer etching with sub-angstrom precision

atomic layer etching 2nm nodes semiconductor fabrication nanomanufacturing precision engineering