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Atomfair High Purity Tantalum Nitride (TaN) Sputtering Target 99.5% (3N5) for Thin Film Deposition

Premium 99.5% pure Tantalum Nitride (TaN) sputtering targets for high-performance thin film deposition applications. Available in various diameters and thicknesses, with optional copper backing for enhanced thermal conductivity. Ideal for semiconductor, optical, and industrial coating processes.

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Description

Premium 99.5% pure Tantalum Nitride (TaN) sputtering targets for high-performance thin film deposition applications. Available in various diameters and thicknesses, with optional copper backing for enhanced thermal conductivity. Ideal for semiconductor, optical, and industrial coating processes.

Product Name Specification Packing Pack Size
Tantalum Nitride (TaN) Target 99.5% purity, Ø50.8×2mm Piece 1
Tantalum Nitride (TaN) Target 99.5% purity, Ø50.8×3mm Piece 1
Tantalum Nitride (TaN) Target with Copper Backing 99.5% purity, Ø50.8×3mm bonded to 2mm copper plate Piece 1
Tantalum Nitride (TaN) Target 99.5% purity, Ø50.8×4mm Piece 1
Tantalum Nitride (TaN) Target with Copper Backing 99.5% purity, Ø50.8×4mm bonded to 2mm copper plate Piece 1
Tantalum Nitride (TaN) Target 99.5% purity, Ø60×3mm Piece 1
Tantalum Nitride (TaN) Target with Copper Backing 99.5% purity, Ø60×3mm bonded to 2mm copper plate Piece 1
Tantalum Nitride (TaN) Target 99.5% purity, Ø60×4mm Piece 1
Tantalum Nitride (TaN) Target with Copper Backing 99.5% purity, Ø60×4mm bonded to 2mm copper plate Piece 1

If you are interested or have any questions, please contact us at inquiry@atomfair.com

Disclaimer: Sold exclusively for laboratory research.

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