Description

Premium 99.5% pure Tantalum Nitride (TaN) sputtering targets for high-performance thin film deposition applications. Available in various diameters and thicknesses, with optional copper backing for enhanced thermal conductivity. Ideal for semiconductor, optical, and industrial coating processes.

Product Name	Specification	Packing	Pack Size
Tantalum Nitride (TaN) Target	99.5% purity, Ø50.8×2mm	Piece	1
Tantalum Nitride (TaN) Target	99.5% purity, Ø50.8×3mm	Piece	1
Tantalum Nitride (TaN) Target with Copper Backing	99.5% purity, Ø50.8×3mm bonded to 2mm copper plate	Piece	1
Tantalum Nitride (TaN) Target	99.5% purity, Ø50.8×4mm	Piece	1
Tantalum Nitride (TaN) Target with Copper Backing	99.5% purity, Ø50.8×4mm bonded to 2mm copper plate	Piece	1
Tantalum Nitride (TaN) Target	99.5% purity, Ø60×3mm	Piece	1
Tantalum Nitride (TaN) Target with Copper Backing	99.5% purity, Ø60×3mm bonded to 2mm copper plate	Piece	1
Tantalum Nitride (TaN) Target	99.5% purity, Ø60×4mm	Piece	1
Tantalum Nitride (TaN) Target with Copper Backing	99.5% purity, Ø60×4mm bonded to 2mm copper plate	Piece	1

If you are interested or have any questions, please contact us at inquiry@atomfair.com

Disclaimer: Sold exclusively for laboratory research.