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Atomfair High Purity Tantalum Carbide (TaC) Sputtering Target, 99.5% (3N5), Various Dimensions with Optional Copper Backing
This high-purity Tantalum Carbide (TaC) sputtering target offers excellent performance for thin film deposition applications. Available in multiple thicknesses with or without a 2mm copper backing plate for enhanced thermal conductivity.
Description
This high-purity Tantalum Carbide (TaC) sputtering target offers excellent performance for thin film deposition applications. Available in multiple thicknesses with or without a 2mm copper backing plate for enhanced thermal conductivity.
| Material | Purity | Dimensions (Diameter × Thickness) | Configuration | Packaging | Pack Size |
|---|---|---|---|---|---|
| Tantalum Carbide (TaC) | 99.5% (3N5) | 50.8mm × 2mm | Standard | Piece | 1 |
| Tantalum Carbide (TaC) | 99.5% (3N5) | 50.8mm × 2mm | Bonded to 2mm Copper Backing Plate | Piece | 1 |
| Tantalum Carbide (TaC) | 99.5% (3N5) | 50.8mm × 3mm | Standard | Piece | 1 |
| Tantalum Carbide (TaC) | 99.5% (3N5) | 50.8mm × 3mm | Bonded to 2mm Copper Backing Plate | Piece | 1 |
| Tantalum Carbide (TaC) | 99.5% (3N5) | 50.8mm × 4mm | Standard | Piece | 1 |
| Tantalum Carbide (TaC) | 99.5% (3N5) | 50.8mm × 4mm | Bonded to 2mm Copper Backing Plate | Piece | 1 |
If you are interested or have any questions, please contact us at inquiry@atomfair.com
Disclaimer: Sold exclusively for laboratory research.
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