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Atomfair High-Purity Silicon Tellurium Alloy Sputtering Target (Si/Te=1/1 at%, 4N, 60mm Diameter)
This Silicon Tellurium (SiTe) alloy sputtering target offers a high-purity (99.99% or 4N) composition with a precise 1:1 atomic ratio of Si to Te. Ideal for thin film deposition in research and industrial applications, it is available in standard or copper-backed configurations for enhanced thermal conductivity.
Description
This Silicon Tellurium (SiTe) alloy sputtering target offers a high-purity (99.99% or 4N) composition with a precise 1:1 atomic ratio of Si to Te. Ideal for thin film deposition in research and industrial applications, it is available in standard or copper-backed configurations for enhanced thermal conductivity.
| Product Type | Specification | Packing | Pack Size |
|---|---|---|---|
| Silicon Tellurium Alloy Target | Si/Te=1/1 at%, 99.99% purity, ฯ60ร3mm | Piece | 1 |
| Silicon Tellurium Alloy Target (Copper-Backed) | Si/Te=1/1 at%, 99.99% purity, ฯ60ร3mm bonded to 2mm copper backing plate | Piece | 1 |
If you are interested or have any questions, please contact us at inquiry@atomfair.com
Disclaimer: Sold exclusively for laboratory research.
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