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Atomfair High Purity Silicon Carbide (SiC) Sputtering Target 99.5% (4N5)
High purity Silicon Carbide (SiC) sputtering targets with 99.5% purity for thin film deposition applications. Available in various diameters and thicknesses, with optional copper backing for enhanced thermal conductivity. Ideal for research and industrial use in semiconductor and coating technologies.
Description
High purity Silicon Carbide (SiC) sputtering targets with 99.5% purity for thin film deposition applications. Available in various diameters and thicknesses, with optional copper backing for enhanced thermal conductivity. Ideal for research and industrial use in semiconductor and coating technologies.
| Diameter (mm) | Thickness (mm) | Configuration | Packing | Pack Size |
|---|---|---|---|---|
| 25.4 | 3, 3.17, 6 | Standalone | Piece | 1 |
| 50 | 3, 4, 5 | Standalone or with 1mm/2mm Copper Backing | Piece | 1 |
| 50.8 | 3, 4, 5 | Standalone or with 1mm/2mm Copper Backing | Piece | 1 |
| 60 | 3, 4, 5 | Standalone or with 1mm/2mm Copper Backing | Piece | 1 |
| 76.2 | 3, 4, 5 | Standalone or with 1mm/2mm Copper Backing | Piece | 1 |
| 101.6 | 3, 4, 5 | Standalone or with 1mm/2mm Copper Backing | Piece | 1 |
If you are interested or have any questions, please contact us at inquiry@atomfair.com
Disclaimer: Sold exclusively for laboratory research.
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