Atomfair

Awaiting product image

Atomfair High Purity Nickel Iron Alloy Sputtering Target (NiFe 80/20, 99.9%)

This Nickel Iron (NiFe) alloy sputtering target offers high purity (99.9%) with an 80/20 composition ratio, available in both atomic percent (at%) and weight percent (wt%) variants. Ideal for thin film deposition applications in research and industrial processes. The targets are precision-manufactured to ensure consistent performance.

Category:

Description

This Nickel Iron (NiFe) alloy sputtering target offers high purity (99.9%) with an 80/20 composition ratio, available in both atomic percent (at%) and weight percent (wt%) variants. Ideal for thin film deposition applications in research and industrial processes. The targets are precision-manufactured to ensure consistent performance.

Composition Purity Dimensions Packaging Pack Size
Ni/Fe=80/20 at% 99.9% ฯ†13.8ร—0.9mm Piece 1
Ni/Fe=80/20 wt% 99.9% ฯ†50ร—3mm Piece 1
Ni/Fe=80/20 wt% 99.9% ฯ†50.8ร—3mm Piece 1
Ni/Fe=80/20 wt% 99.9% ฯ†60ร—3mm Piece 1
Ni/Fe=80/20 wt% 99.9% ฯ†76.2ร—3mm Piece 1
Ni/Fe=80/20 wt% 99.9% ฯ†80ร—3mm Piece 1
Ni/Fe=80/20 wt% 99.9% ฯ†100ร—3mm Piece 1
Ni/Fe=80/20 wt% 99.9% ฯ†101.6ร—3mm Piece 1

If you are interested or have any questions, please contact us at inquiry@atomfair.com

Disclaimer: Sold exclusively for laboratory research.

Reviews

There are no reviews yet.

Only logged in customers who have purchased this product may leave a review.

Related products