Description
This Nickel Iron (NiFe) alloy sputtering target offers high purity (99.9%) with an 80/20 composition ratio, available in both atomic percent (at%) and weight percent (wt%) variants. Ideal for thin film deposition applications in research and industrial processes. The targets are precision-manufactured to ensure consistent performance.
| Composition | Purity | Dimensions | Packaging | Pack Size |
|---|---|---|---|---|
| Ni/Fe=80/20 at% | 99.9% | φ13.8×0.9mm | Piece | 1 |
| Ni/Fe=80/20 wt% | 99.9% | φ50×3mm | Piece | 1 |
| Ni/Fe=80/20 wt% | 99.9% | φ50.8×3mm | Piece | 1 |
| Ni/Fe=80/20 wt% | 99.9% | φ60×3mm | Piece | 1 |
| Ni/Fe=80/20 wt% | 99.9% | φ76.2×3mm | Piece | 1 |
| Ni/Fe=80/20 wt% | 99.9% | φ80×3mm | Piece | 1 |
| Ni/Fe=80/20 wt% | 99.9% | φ100×3mm | Piece | 1 |
| Ni/Fe=80/20 wt% | 99.9% | φ101.6×3mm | Piece | 1 |
If you are interested or have any questions, please contact us at inquiry@atomfair.com
Disclaimer: Sold exclusively for laboratory research.
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