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Atomfair High Purity Nickel Cobalt Chromium Aluminum Yttrium (NiCoCrAlY) Alloy Sputtering Target
High-purity NiCoCrAlY alloy sputtering target with precise composition (Ni/Co/Cr/Al/Y = 39.5/23/22/15/0.5 at%) for thin film deposition applications. Manufactured via powder metallurgy process, ensuring uniform density and excellent performance. Ideal for research and industrial coating processes.
Description
High-purity NiCoCrAlY alloy sputtering target with precise composition (Ni/Co/Cr/Al/Y = 39.5/23/22/15/0.5 at%) for thin film deposition applications. Manufactured via powder metallurgy process, ensuring uniform density and excellent performance. Ideal for research and industrial coating processes.
| Product Name | Composition (at%) | Purity | Dimensions | Manufacturing Process | Packaging | Packaging Size |
|---|---|---|---|---|---|---|
| Nickel Cobalt Chromium Aluminum Yttrium (NiCoCrAlY) Alloy Target | Ni/Co/Cr/Al/Y = 39.5/23/22/15/0.5 | 99.5% | ฯ60 ร 3mm | Powder Metallurgy | Piece | 1 |
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Disclaimer: Sold exclusively for laboratory research.
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