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Atomfair High-Purity Nickel Cobalt Chromium Aluminum Tantalum Yttrium Alloy Sputtering Target (NiCoCrAlTaY)
This NiCoCrAlTaY alloy sputtering target is manufactured via powder metallurgy, offering high purity (99.5%) and precise composition for advanced coating applications. Ideal for research and industrial use in thin-film deposition.
Description
This NiCoCrAlTaY alloy sputtering target is manufactured via powder metallurgy, offering high purity (99.5%) and precise composition for advanced coating applications. Ideal for research and industrial use in thin-film deposition.
| Product Name | Composition (at%) | Purity | Dimensions | Packaging |
|---|---|---|---|---|
| Nickel Cobalt Chromium Aluminum Tantalum Yttrium Alloy Target | Ni/Co/Cr/Al/Ta/Y = 33.5/23/22/15/6/0.5 | 99.5% | ฯ60 ร 3mm | 1 piece per pack |
If you are interested or have any questions, please contact us at inquiry@atomfair.com
Disclaimer: Sold exclusively for laboratory research.
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