Atomfair High Purity Molybdenum Disulfide (MoS2) Sputtering Target 99.9% (4N)

High purity 99.9% (4N) molybdenum disulfide (MoS2) sputtering target for thin film deposition applications. Available in various diameters and thicknesses, with optional copper backing for enhanced thermal conductivity. Ideal for research and industrial coating processes.

Description

High purity 99.9% (4N) molybdenum disulfide (MoS2) sputtering target for thin film deposition applications. Available in various diameters and thicknesses, with optional copper backing for enhanced thermal conductivity. Ideal for research and industrial coating processes.

Configuration Dimensions Packing Quantity
MoS2 Target 99.9% purity, ร˜50ร—3mm Piece 1
MoS2 Target with Copper Backing 99.9% purity, ร˜50ร—3mm bonded to 2mm copper Piece 1
MoS2 Target 99.9% purity, ร˜50.8ร—3mm Piece 1
MoS2 Target with Copper Backing 99.9% purity, ร˜50.8ร—3mm bonded to 2mm copper (total thickness 5mm) Piece 1
MoS2 Target 99.9% purity, ร˜60ร—3mm Piece 1
MoS2 Target with Copper Backing 99.9% purity, ร˜60ร—3mm bonded to 2mm copper Piece 1
MoS2 Target 99.9% purity, ร˜68ร—2.5mm Piece 1
MoS2 Target with Copper Backing 99.9% purity, ร˜68ร—2.5mm bonded to 2mm copper Piece 1
MoS2 Target 99.9% purity, ร˜74.85ร—3.2mm Piece 1
MoS2 Target with Copper Backing 99.9% purity, ร˜74.85ร—3.2mm bonded to 2mm copper Piece 1
MoS2 Target 99.9% purity, 79.85ร—99.85ร—3mm Piece 1
MoS2 Target with Copper Backing 99.9% purity, 79.85ร—99.85ร—3mm bonded to 2mm copper Piece 1
MoS2 Target 99.9% purity, ร˜76.2ร—3mm Piece 1
MoS2 Target with Copper Backing 99.9% purity, ร˜76.2ร—3mm bonded to 2mm copper Piece 1
MoS2 Target 99.9% purity, ร˜101.6ร—3mm Piece 1
MoS2 Target with Copper Backing 99.9% purity, ร˜101.6ร—3mm bonded to 2mm copper Piece 1

If you are interested or have any questions, please contact us at inquiry@atomfair.com

Disclaimer: Sold exclusively for laboratory research.

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