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Atomfair High Purity Manganese-Aluminum Alloy Sputtering Target (AlMn 90/10 wt%, 99.5% purity)
This manganese-aluminum alloy (AlMn) sputtering target offers 90/10 wt% composition with 99.5% purity, ideal for thin film deposition applications. Manufactured using powder metallurgy process, it features standard dimensions of 50×50×2mm with characteristic surface spots from production.
Description
This manganese-aluminum alloy (AlMn) sputtering target offers 90/10 wt% composition with 99.5% purity, ideal for thin film deposition applications. Manufactured using powder metallurgy process, it features standard dimensions of 50×50×2mm with characteristic surface spots from production.
| Parameter | Specification |
|---|---|
| Material | Manganese-Aluminum Alloy (AlMn) |
| Composition | Mn/Al = 90/10 wt% |
| Purity | 99.5% |
| Dimensions | 50 × 50 × 2 mm |
| Manufacturing Process | Powder Metallurgy |
| Surface Characteristics | May exhibit production spots |
| Packaging Unit | Per piece |
| Package Type | Individual plate packaging |
If you are interested or have any questions, please contact us at inquiry@atomfair.com
Disclaimer: Sold exclusively for laboratory research.
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