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Atomfair High-Purity Gold-Tin Alloy Sputtering Target (Au80Sn20, 4N)
High-purity 99.99% (4N) gold-tin alloy sputtering target with a composition of 80% gold and 20% tin by weight. Ideal for thin-film deposition in semiconductor and electronic applications. Precision-made with consistent quality for reliable performance.
Description
High-purity 99.99% (4N) gold-tin alloy sputtering target with a composition of 80% gold and 20% tin by weight. Ideal for thin-film deposition in semiconductor and electronic applications. Precision-made with consistent quality for reliable performance.
| Product Name | Composition | Purity | Dimensions | Packaging | Packaging Size |
|---|---|---|---|---|---|
| Gold-Tin Alloy Target | Au:Sn = 80:20 wt% | 99.99% (4N) | ฯ101.6 ร 3mm | Piece | 1 |
If you are interested or have any questions, please contact us at inquiry@atomfair.com
Disclaimer: Sold exclusively for laboratory research.
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