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Atomfair High Purity Copper Oxide (CuO) Sputtering Target, 99.9% (3N)
High purity Copper Oxide (CuO) sputtering target with 99.9% purity, ideal for thin film deposition and research applications. Available in various diameters and thicknesses to suit different sputtering systems. Each target is individually packed to ensure quality and prevent damage during shipping.
Description
High purity Copper Oxide (CuO) sputtering target with 99.9% purity, ideal for thin film deposition and research applications. Available in various diameters and thicknesses to suit different sputtering systems. Each target is individually packed to ensure quality and prevent damage during shipping.
| Diameter (mm) | Thickness (mm) | Purity | Packing | Pack Size |
|---|---|---|---|---|
| 50.8 | 3 | 99.9% | Piece | 1 |
| 50.8 | 4 | 99.9% | Piece | 1 |
| 60 | 3 | 99.9% | Piece | 1 |
| 76.2 | 3 | 99.9% | Piece | 1 |
| 76.2 | 5 | 99.9% | Piece | 1 |
| 80 | 3 | 99.9% | Piece | 1 |
| 101.6 | 3 | 99.9% | Piece | 1 |
If you are interested or have any questions, please contact us at inquiry@atomfair.com
Disclaimer: Sold exclusively for laboratory research.
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