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Atomfair High Purity Cobalt Oxide (Co3O4) Sputtering Target, 4N (99.95%), Bonded with 3mm Copper Backing Plate
This high-purity Cobalt Oxide (Co3O4) sputtering target offers 99.95% (4N) purity, ideal for thin-film deposition applications. The target is precision-bonded to a 3mm copper backing plate for enhanced thermal conductivity and stability during use. Suitable for research and industrial applications requiring consistent performance.
Description
This high-purity Cobalt Oxide (Co3O4) sputtering target offers 99.95% (4N) purity, ideal for thin-film deposition applications. The target is precision-bonded to a 3mm copper backing plate for enhanced thermal conductivity and stability during use. Suitable for research and industrial applications requiring consistent performance.
| Material | Purity | Dimensions | Backing Plate | Packaging | Packaging Size |
|---|---|---|---|---|---|
| Cobalt Oxide (Co3O4) | 99.95% (4N) | ฯ50 ร 2mm | 3mm Copper | Piece | 1 |
Note: The target may decompose under certain conditions due to its inherent instability.
If you are interested or have any questions, please contact us at inquiry@atomfair.com
Disclaimer: Sold exclusively for laboratory research.
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