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Atomfair High Purity Cobalt Iron Boron (CoFeB) Alloy Sputtering Target, 99.9% (3N)

This high-purity Cobalt Iron Boron (CoFeB) alloy sputtering target is ideal for thin film deposition in research and industrial applications. With a precise atomic ratio of Co/Fe/B=20/60/20 and 99.9% purity, it ensures consistent performance in vacuum environments.

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Description

This high-purity Cobalt Iron Boron (CoFeB) alloy sputtering target is ideal for thin film deposition in research and industrial applications. With a precise atomic ratio of Co/Fe/B=20/60/20 and 99.9% purity, it ensures consistent performance in vacuum environments.

Product Name Composition (at%) Purity Dimensions (Diameter ร— Thickness) Packaging Pack Size
Cobalt Iron Boron Alloy Target Co/Fe/B=20/60/20 99.9% ฯ†50.8 ร— 3mm Piece 1
Cobalt Iron Boron Alloy Target Co/Fe/B=20/60/20 99.9% ฯ†60 ร— 3mm Piece 1
Cobalt Iron Boron Alloy Target Co/Fe/B=20/60/20 99.9% ฯ†76.2 ร— 3mm Piece 1
Cobalt Iron Boron Alloy Target Co/Fe/B=20/60/20 99.9% ฯ†80 ร— 3mm Piece 1
Cobalt Iron Boron Alloy Target Co/Fe/B=20/60/20 99.9% ฯ†100 ร— 3mm Piece 1
Cobalt Iron Boron Alloy Target Co/Fe/B=20/60/20 99.9% ฯ†101.6 ร— 3mm Piece 1

If you are interested or have any questions, please contact us at inquiry@atomfair.com

Disclaimer: Sold exclusively for laboratory research.

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