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Atomfair High Purity Chromium Aluminum Alloy Sputtering Target (CrAl 80:20 at%, 99.5%)
This Chromium Aluminum (CrAl) alloy sputtering target offers high purity (99.5%) with an 80:20 atomic ratio composition. Ideal for thin film deposition applications, it comes in a standard disc size of φ100×4mm and is produced via hot pressing for consistent quality.
Description
This Chromium Aluminum (CrAl) alloy sputtering target offers high purity (99.5%) with an 80:20 atomic ratio composition. Ideal for thin film deposition applications, it comes in a standard disc size of φ100×4mm and is produced via hot pressing for consistent quality.
| Product Name | Composition (at%) | Purity | Dimensions | Production Method | Packaging | Pack Size |
|---|---|---|---|---|---|---|
| Chromium Aluminum Alloy Target | Cr:Al = 80:20 | 99.5% | φ100×4mm | Hot Pressed | Piece | 1 |
If you are interested or have any questions, please contact us at inquiry@atomfair.com
Disclaimer: Sold exclusively for laboratory research.
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