Your cart is currently empty!
Atomfair High Purity Chromium Aluminum Alloy Sputtering Target (CrAl 80:20 at%, 99.5%)
This Chromium Aluminum (CrAl) alloy sputtering target offers high purity (99.5%) with an 80:20 atomic ratio composition. Ideal for thin film deposition applications, it comes in a standard disc size of φ100×4mm and is produced via hot pressing for consistent quality.
Description
This Chromium Aluminum (CrAl) alloy sputtering target offers high purity (99.5%) with an 80:20 atomic ratio composition. Ideal for thin film deposition applications, it comes in a standard disc size of φ100×4mm and is produced via hot pressing for consistent quality.
| Product Name | Composition (at%) | Purity | Dimensions | Production Method | Packaging | Pack Size |
|---|---|---|---|---|---|---|
| Chromium Aluminum Alloy Target | Cr:Al = 80:20 | 99.5% | φ100×4mm | Hot Pressed | Piece | 1 |
If you are interested or have any questions, please contact us at inquiry@atomfair.com
Disclaimer: Sold exclusively for laboratory research.
Only logged in customers who have purchased this product may leave a review.
Related products
-
Atomfair 4N High Purity Chromium-Plated Tungsten Wire (99.99% Pure)
-
Atomfair 6N High Purity Intrinsic Silicon Sputtering Target (P-Type/N-Type/Undoped)
-
Atomfair 6N High Purity N-Type Silicon Sputtering Target (Si)
-
Atomfair 6N High Purity P-Type Silicon Sputtering Target (99.9999%)
-
Atomfair 6N High Purity Polycrystalline Copper Wire (99.9999% Pure, 0.25mm Diameter, 1kg Spool)
Reviews
There are no reviews yet.