Atomfair High Purity Aluminum Nitride (AlN) Sputtering Target – 99.5% (3N5) Pure

This high-purity Aluminum Nitride (AlN) sputtering target is ideal for thin film deposition in semiconductor and optical applications. Available in various diameters and thicknesses, with optional copper backing for enhanced thermal conductivity. The 99.5% purity ensures consistent performance in demanding deposition processes.

Description

This high-purity Aluminum Nitride (AlN) sputtering target is ideal for thin film deposition in semiconductor and optical applications. Available in various diameters and thicknesses, with optional copper backing for enhanced thermal conductivity. The 99.5% purity ensures consistent performance in demanding deposition processes.

Diameter (mm) Thickness (mm) Configuration Packing Pack Size
50 3 Standard or with 2mm copper backing Piece 1
50.8 3 Standard or with 2mm copper backing Piece 1
50 4 Standard or with 2mm copper backing Piece 1
50.8 4 Standard or with 2mm copper backing Piece 1
50 5 Standard Piece 1
50 6 Standard Piece 1
50.8 5 Standard Piece 1
50.8 6 Standard Piece 1
60 3 Standard or with 2mm copper backing Piece 1
60 4 Standard or with 2mm copper backing Piece 1
60 5 Standard Piece 1
60 6 Standard Piece 1
76.2 3 Standard or with 2mm copper backing Piece 1
76.2 4 Standard or with 2mm copper backing Piece 1
76.2 5 Standard Piece 1
76.2 6 Standard Piece 1
80 3 Standard or with 2mm copper backing Piece 1
80 4 Standard or with 2mm copper backing Piece 1
80 5 Standard Piece 1
80 6 Standard Piece 1
101.6 3 Standard or with 2mm copper backing Piece 1
101.6 4 Standard or with 2mm copper backing Piece 1
101.6 5 Standard Piece 1
101.6 6 Standard Piece 1

If you are interested or have any questions, please contact us at inquiry@atomfair.com

Disclaimer: Sold exclusively for laboratory research.

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