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Atomfair High Purity 4N Tungsten Trioxide (WO3) Sputtering Target
This high-purity 99.9% (4N) tungsten trioxide (WO3) sputtering target is designed for thin film deposition applications. Available in multiple diameters and thicknesses, with optional copper backing for enhanced thermal conductivity. Ideal for research and industrial use in optics, electronics, and energy storage.
Description
This high-purity 99.9% (4N) tungsten trioxide (WO3) sputtering target is designed for thin film deposition applications. Available in multiple diameters and thicknesses, with optional copper backing for enhanced thermal conductivity. Ideal for research and industrial use in optics, electronics, and energy storage.
Diameter (mm) | Thickness (mm) | Configuration | Packing |
---|---|---|---|
25.4 | 3, 4, 5, 6 | Standard | 1 pc per pack |
50 | 2, 3, 4 | Standard or with 2mm copper backing | 1 pc per pack |
50.8 | 3, 4, 5 | Standard or with 1-2mm copper backing | 1 pc per pack |
60 | 3, 4, 5, 6 | Standard | 1 pc per pack |
76.2 | 3, 4, 5, 6 | Standard | 1 pc per pack |
80 | 3, 4, 5, 6 | Standard | 1 pc per pack |
100 | 3, 4, 5, 6 | Standard | 1 pc per pack |
101.6 | 3, 4, 5, 6 | Standard | 1 pc per pack |
If you are interested or have any questions, please contact us at inquiry@atomfair.com
Disclaimer: Sold exclusively for laboratory research.
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