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Atomfair High Purity 4N Tungsten Titanium Alloy Sputtering Target (W/Ti=90/10 wt%)
This high-purity 4N (99.99%) Tungsten Titanium (W/Ti=90/10 wt%) alloy sputtering target is ideal for thin film deposition applications. Available in multiple diameters and thicknesses, it is manufactured using powder hot-pressing for consistent quality.
Description
This high-purity 4N (99.99%) Tungsten Titanium (W/Ti=90/10 wt%) alloy sputtering target is ideal for thin film deposition applications. Available in multiple diameters and thicknesses, it is manufactured using powder hot-pressing for consistent quality.
| Composition | Purity | Dimensions | Manufacturing Method | Packaging | Pack Size |
|---|---|---|---|---|---|
| W/Ti=90/10 wt% | 99.99% (4N) | Ø50.8×6mm | Powder Hot-Pressed | Piece | 1 |
| W/Ti=90/10 wt% | 99.99% (4N) | Ø100×5mm | – | Piece | 1 |
| W/Ti=90/10 wt% | 99.99% (4N) | Ø100×4mm | – | Piece | 1 |
If you are interested or have any questions, please contact us at inquiry@atomfair.com
Disclaimer: Sold exclusively for laboratory research.
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