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Atomfair High-Purity 4N Tungsten-Titanium Alloy Sputtering Target (W/Ti=90/10 wt%)
This high-purity 4N (99.99%) tungsten-titanium alloy sputtering target is ideal for thin film deposition applications. Available in multiple diameters and thicknesses, it is manufactured using powder hot-pressing for consistent quality.
Description
This high-purity 4N (99.99%) tungsten-titanium alloy sputtering target is ideal for thin film deposition applications. Available in multiple diameters and thicknesses, it is manufactured using powder hot-pressing for consistent quality.
| Composition | Purity | Dimensions | Manufacturing Method | Packaging |
|---|---|---|---|---|
| W/Ti=90/10 wt% | 99.99% (4N) | Ø50.8×6mm | Powder hot-pressed | 1 piece per pack |
| W/Ti=90/10 wt% | 99.99% (4N) | Ø100×5mm | – | 1 piece per pack |
| W/Ti=90/10 wt% | 99.99% (4N) | Ø100×4mm | – | 1 piece per pack |
If you are interested or have any questions, please contact us at inquiry@atomfair.com
Disclaimer: Sold exclusively for laboratory research.
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