Atomfair High Purity 4N Titanium Dioxide (TiO2) Sputtering Target

This high purity 99.99% (4N) Titanium Dioxide (TiO2) sputtering target is ideal for thin film deposition applications. Available in various diameters and thicknesses, with options for conductive black or copper-backed configurations. Suitable for research and industrial applications requiring precise material properties.

Description

This high purity 99.99% (4N) Titanium Dioxide (TiO2) sputtering target is ideal for thin film deposition applications. Available in various diameters and thicknesses, with options for conductive black or copper-backed configurations. Suitable for research and industrial applications requiring precise material properties.

Configuration Diameter (mm) Thickness (mm) Backing Packing
Black 25.4 3 None 1 pc
Black 25.4 6 None 1 pc
Black Conductive 50.8 3 None 1 pc
Bonded 50.8 3 2mm Copper 1 pc
Black Conductive 50.8 4 None 1 pc
Bonded 50.8 4 2mm Copper 1 pc
Black Conductive 50.8 5 None 1 pc
Black Conductive 60 3 None 1 pc
Bonded 60 3 2mm Copper 1 pc
Black Conductive 60 4 None 1 pc
Bonded 60 4 2mm Copper 1 pc
Black Conductive 76.2 3 None 1 pc
Bonded 76.2 3 2mm Copper 1 pc
Black Conductive 76.2 4 None 1 pc
Bonded 76.2 4 2mm Copper 1 pc
Black Conductive 101.6 3 None 1 pc
Bonded 101.6 3 2mm Copper 1 pc
Black Conductive 101.6 4 None 1 pc

If you are interested or have any questions, please contact us at inquiry@atomfair.com

Disclaimer: Sold exclusively for laboratory research.

Reviews

There are no reviews yet.

Only logged in customers who have purchased this product may leave a review.