Atomfair High Purity 4N Tantalum Oxide (Ta2O5) Sputtering Target

Premium 99.99% pure Tantalum Oxide (Ta2O5) sputtering target for thin film deposition applications. Available in standard and copper-backed configurations for enhanced thermal conductivity and durability.

Description

Premium 99.99% pure Tantalum Oxide (Ta2O5) sputtering target for thin film deposition applications. Available in standard and copper-backed configurations for enhanced thermal conductivity and durability.

Product Name Purity Dimensions Configuration Packing Pack Size
Tantalum Oxide (Ta2O5) Target 99.99% (4N) ฯ†50.8ร—3mm Standard Piece 1
Tantalum Oxide (Ta2O5) Target 99.99% (4N) 50.8ร—3mm Bonded to 2mm Copper Backing Plate Piece 1

If you are interested or have any questions, please contact us at inquiry@atomfair.com

Disclaimer: Sold exclusively for laboratory research.

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