Atomfair High Purity 4N Lithium-Doped Bismuth Ferrite (BiFeO3) Sputtering Target (10% Li Excess)

This high-purity 4N (99.99%) lithium-doped bismuth ferrite (BiFeO3) sputtering target is ideal for thin film deposition applications. The target features a 10% lithium excess for enhanced performance in specialized research and industrial processes. Available in various diameters and configurations, including copper-backed options for improved thermal management.

Description

This high-purity 4N (99.99%) lithium-doped bismuth ferrite (BiFeO3) sputtering target is ideal for thin film deposition applications. The target features a 10% lithium excess for enhanced performance in specialized research and industrial processes. Available in various diameters and configurations, including copper-backed options for improved thermal management.

Composition Purity Dimensions Configuration Packaging Quantity
BiFeO3 (Li-doped) 99.99% (4N) φ25×6mm Standard Piece 20
BiFeO3 99.9% φ50.8×3mm Standard Piece 1
BiFeO3 99.9% φ50.8×3mm 1mm Copper Backing Piece 1
BiFeO3 99.9% φ60×3mm Standard Piece 1
BiFeO3 99.9% φ60×3mm 2mm Copper Backing Piece 1
BiFeO3 99.9% φ76.2×3mm Standard Piece 1
BiFeO3 99.9% φ76.2×3mm 2mm Copper Backing Piece 1
BiFeO3 99.9% φ80×3mm Standard Piece 1
BiFeO3 99.9% φ80×3mm 2mm Copper Backing Piece 1
BiFeO3 99.9% φ100×3mm Standard Piece 1
BiFeO3 99.9% φ100×3mm 2mm Copper Backing Piece 1
BiFeO3 99.9% φ101.6×3mm Standard Piece 1
BiFeO3 99.9% φ101.6×3mm 2mm Copper Backing Piece 1

If you are interested or have any questions, please contact us at inquiry@atomfair.com

Disclaimer: Sold exclusively for laboratory research.

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