Description
This high-purity iron oxide (Fe2O3) sputtering target is ideal for thin film deposition applications. With 99.99% purity (4N), it ensures consistent performance in research and industrial processes. The target comes in a standard disc form with precise dimensions.
| Material | Purity | Dimensions | Form | Packaging |
|---|---|---|---|---|
| Iron Oxide (Fe2O3) | 99.99% (4N) | φ60mm × 3mm | Disc | 1 piece per unit |
If you are interested or have any questions, please contact us at inquiry@atomfair.com
Disclaimer: Sold exclusively for laboratory research.
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