Description
This high-purity 99.99% (4N) Indium Oxide (In2O3) sputtering target is designed for thin film deposition applications. Available in multiple diameters and thicknesses, with optional copper backing plates for enhanced thermal conductivity. Ideal for research and industrial use in optoelectronics and transparent conductive coatings.
| Diameter (mm) | Thickness (mm) | Configuration | Packing |
|---|---|---|---|
| 25.4 | 3, 4, 5, 6 | Standard | 1 pc per unit |
| 50 | 3, 4, 5, 6 | Standard or with 2mm/1mm Cu backing | 1 pc per unit |
| 50.8 | 3, 4, 5, 6 | Standard or with 2mm/1mm Cu backing | 1 pc per unit |
| 60 | 3, 4, 5, 6 | Standard or with 2mm/1mm Cu backing | 1 pc per unit |
| 76.2 | 3, 4, 5, 6 | Standard or with 2mm/1mm Cu backing | 1 pc per unit |
| 80 | 3, 4, 5, 6 | Standard or with 2mm/1mm Cu backing | 1 pc per unit |
| 100 | 3, 4, 5, 6 | Standard or with 2mm/1mm Cu backing | 1 pc per unit |
| 101.6 | 3, 4, 5, 6 | Standard or with 2mm/1mm Cu backing | 1 pc per unit |
If you are interested or have any questions, please contact us at inquiry@atomfair.com
Disclaimer: Sold exclusively for laboratory research.
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