Description
This gadolinium gallium oxide (Gd3Ga5O12) sputtering target is manufactured by sintering high-purity gadolinium oxide (Gd2O3) and gallium oxide (Ga2O3) powders at a 3:5 atomic ratio. With 99.99% purity (4N), it is ideal for thin film deposition in research and industrial applications. Available in standard diameters with optional copper backing for enhanced thermal conductivity.
| Configuration | Dimensions (Diameter × Thickness) | Backing Plate | Packing |
|---|---|---|---|
| Gd3Ga5O12 target | φ50.8 × 3mm | None | 1 pc per unit |
| Gd3Ga5O12 target | φ50.8 × 3mm | 2mm copper | 1 pc per unit |
| Gd3Ga5O12 target | φ50.8 × 4mm | None | 1 pc per unit |
| Gd3Ga5O12 target | φ50.8 × 4mm | 2mm copper | 1 pc per unit |
| Gd3Ga5O12 target | φ50.8 × 5mm | None | 1 pc per unit |
| Gd3Ga5O12 target | φ50.8 × 5mm | 2mm copper | 1 pc per unit |
All targets are fabricated from 99.99% pure Gd2O3 and Ga2O3 powders with precise 3:5 atomic ratio composition through sintering process.
If you are interested or have any questions, please contact us at inquiry@atomfair.com
Disclaimer: Sold exclusively for laboratory research.
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