Atomfair High Purity 4N Copper (Cu) Sputtering Target – 99.95% Pure

This high purity copper (Cu) sputtering target offers 99.95% (4N) purity for precision thin film deposition. Available in multiple diameters and thicknesses to suit various PVD applications. Each target is individually packed to ensure surface quality and prevent contamination.

Description

This high purity copper (Cu) sputtering target offers 99.95% (4N) purity for precision thin film deposition. Available in multiple diameters and thicknesses to suit various PVD applications. Each target is individually packed to ensure surface quality and prevent contamination.

Material Purity Diameter (mm) Thickness (mm) Packaging Pack Size
Copper Target 99.95% 57 0.5 Piece 1
Copper Target 99.95% 57 1 Piece 1
Copper Target 99.95% 50 3 Piece 1
Copper Target 99.95% 50 4 Piece 1
Copper Target 99.95% 50 5 Piece 1
Copper Target 99.95% 50 6 Piece 1
Copper Target 99.95% 60 3 Piece 1
Copper Target 99.95% 60 4 Piece 1
Copper Target 99.95% 60 5 Piece 1
Copper Target 99.95% 76.2 3 Piece 1
Copper Target 99.95% 76.2 4 Piece 1
Copper Target 99.95% 76.2 5 Piece 1
Copper Target 99.95% 76.2 6 Piece 1
Copper Target 99.95% 76.2 7 Piece 1
Copper Target 99.95% 80 3 Piece 1
Copper Target 99.95% 80 5 Piece 1
Copper Target 99.95% 101.6 2 Piece 1
Copper Target 99.95% 101.6 3 Piece 1
Copper Target 99.95% 101.6 4 Piece 1
Copper Target 99.95% 101.6 5 Piece 1

If you are interested or have any questions, please contact us at inquiry@atomfair.com

Disclaimer: Sold exclusively for laboratory research.

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