Atomfair High Purity 4N Bismuth Telluride Sputtering Target (Bi38Te62) – Bi2Te3 Alloy

High purity 99.99% (4N) Bismuth Telluride (Bi38Te62) sputtering target for thin film deposition applications. Available in standard disc configuration or with copper backing plate for enhanced thermal management during deposition processes.

Description

High purity 99.99% (4N) Bismuth Telluride (Bi38Te62) sputtering target for thin film deposition applications. Available in standard disc configuration or with copper backing plate for enhanced thermal management during deposition processes.

Product Variant Specification Packaging Pack Size
Bismuth Telluride Target 99.99% purity, ฯ†50.8mm ร— 4mm thickness Piece 1
Bismuth Telluride Target with Copper Backing 99.99% purity, ฯ†50.8mm ร— 4mm bonded to 2mm copper plate Piece 1

If you are interested or have any questions, please contact us at inquiry@atomfair.com

Disclaimer: Sold exclusively for laboratory research.

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