Description
This AZO (Aluminum-doped Zinc Oxide) sputtering target offers 99.99% (4N) purity with a precise 98:2 wt% ZnO:Al2O3 composition. Ideal for thin film deposition in semiconductor and optoelectronic applications. Available in multiple diameters and thicknesses to suit various sputtering systems.
| Composition | Purity | Dimensions | Packaging |
|---|---|---|---|
| ZnO:Al2O3 = 98:2 wt% | 99.99% | φ50.8×3mm | 1 pc per pack |
| ZnO:Al2O3 = 98:2 wt% | 99.99% | φ50.8×4mm | 1 pc per pack |
| ZnO:Al2O3 = 98:2 wt% | 99.99% | φ50.8×5mm | 1 pc per pack |
| ZnO:Al2O3 = 98:2 wt% | 99.99% | φ76.2×6mm | 1 pc per pack |
| ZnO:Al2O3 = 98:2 wt% | 99.99% | φ80×3mm bonded with 2mm copper backing | 1 pc per pack |
If you are interested or have any questions, please contact us at inquiry@atomfair.com
Disclaimer: Sold exclusively for laboratory research.
Reviews
There are no reviews yet.