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Atomfair High Purity 4N AZO Sputtering Target (ZnO:Al2O3 = 98:2 wt%)
This AZO (Aluminum-doped Zinc Oxide) sputtering target offers 99.99% (4N) purity with a precise 98:2 wt% ZnO:Al2O3 composition. Ideal for thin film deposition in semiconductor and optoelectronic applications. Available in multiple diameters and thicknesses to suit various sputtering systems.
Description
This AZO (Aluminum-doped Zinc Oxide) sputtering target offers 99.99% (4N) purity with a precise 98:2 wt% ZnO:Al2O3 composition. Ideal for thin film deposition in semiconductor and optoelectronic applications. Available in multiple diameters and thicknesses to suit various sputtering systems.
| Composition | Purity | Dimensions | Packaging |
|---|---|---|---|
| ZnO:Al2O3 = 98:2 wt% | 99.99% | ฯ50.8ร3mm | 1 pc per pack |
| ZnO:Al2O3 = 98:2 wt% | 99.99% | ฯ50.8ร4mm | 1 pc per pack |
| ZnO:Al2O3 = 98:2 wt% | 99.99% | ฯ50.8ร5mm | 1 pc per pack |
| ZnO:Al2O3 = 98:2 wt% | 99.99% | ฯ76.2ร6mm | 1 pc per pack |
| ZnO:Al2O3 = 98:2 wt% | 99.99% | ฯ80ร3mm bonded with 2mm copper backing | 1 pc per pack |
If you are interested or have any questions, please contact us at inquiry@atomfair.com
Disclaimer: Sold exclusively for laboratory research.
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