Atomfair High Purity 4N Aluminum Zinc Oxide (AZO) Sputtering Target (ZnO/Al2O3 98/2 wt%)

This high-purity 99.99% (4N) Aluminum Zinc Oxide (AZO) sputtering target is composed of 98% ZnO and 2% Al2O3 by weight. Ideal for thin film deposition in research and industrial applications. Available in various diameters and thicknesses, with optional copper backing for enhanced performance.

Description

This high-purity 99.99% (4N) Aluminum Zinc Oxide (AZO) sputtering target is composed of 98% ZnO and 2% Al2O3 by weight. Ideal for thin film deposition in research and industrial applications. Available in various diameters and thicknesses, with optional copper backing for enhanced performance.

Diameter (mm) Thickness (mm) Configuration Packing
φ25.4 3, 4, 5, 6 Standard 1 pc
φ50 / φ50.8 3, 4, 5, 6 Standard or with 2mm copper backing 1 pc
φ60 3, 4, 5, 6 Standard or with 2mm copper backing 1 pc
φ76.2 3, 4, 5, 6 Standard or with 2mm copper backing 1 pc
φ80 3, 4, 5, 6 Standard or with 2mm copper backing 1 pc
φ100 / φ101.6 3, 4, 5, 6 Standard or with 2mm copper backing 1 pc

If you are interested or have any questions, please contact us at inquiry@atomfair.com

Disclaimer: Sold exclusively for laboratory research.

Reviews

There are no reviews yet.

Only logged in customers who have purchased this product may leave a review.