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Atomfair High Purity 4N Aluminum Zinc Oxide (AZO) Sputtering Target (ZnO/Al2O3 98/2 wt%)
This high-purity 99.99% (4N) Aluminum Zinc Oxide (AZO) sputtering target is composed of 98% ZnO and 2% Al2O3 by weight. Ideal for thin film deposition in research and industrial applications. Available in various diameters and thicknesses, with optional copper backing for enhanced performance.
Description
This high-purity 99.99% (4N) Aluminum Zinc Oxide (AZO) sputtering target is composed of 98% ZnO and 2% Al2O3 by weight. Ideal for thin film deposition in research and industrial applications. Available in various diameters and thicknesses, with optional copper backing for enhanced performance.
| Diameter (mm) | Thickness (mm) | Configuration | Packing |
|---|---|---|---|
| ฯ25.4 | 3, 4, 5, 6 | Standard | 1 pc |
| ฯ50 / ฯ50.8 | 3, 4, 5, 6 | Standard or with 2mm copper backing | 1 pc |
| ฯ60 | 3, 4, 5, 6 | Standard or with 2mm copper backing | 1 pc |
| ฯ76.2 | 3, 4, 5, 6 | Standard or with 2mm copper backing | 1 pc |
| ฯ80 | 3, 4, 5, 6 | Standard or with 2mm copper backing | 1 pc |
| ฯ100 / ฯ101.6 | 3, 4, 5, 6 | Standard or with 2mm copper backing | 1 pc |
If you are interested or have any questions, please contact us at inquiry@atomfair.com
Disclaimer: Sold exclusively for laboratory research.
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