Description
This Aluminum Silicon Yttrium (AlSiY) alloy sputtering target offers high purity (99.9%) with a precise composition of Al:Si:Y = 94.3:4.5:1.2 wt%. Ideal for thin film deposition applications, it is manufactured using hot-pressing technology for consistent quality.
| Product Name | Composition (wt%) | Purity | Dimensions | Process | Packaging | Pack Size |
|---|---|---|---|---|---|---|
| Aluminum Silicon Yttrium Alloy Target | Al:Si:Y = 94.3:4.5:1.2 | 99.9% (4N) | 100mm × 4mm | Hot-Pressed | Piece | 1 |
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Disclaimer: Sold exclusively for laboratory research.
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