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Atomfair High Purity 4N Aluminum Oxide (Al2O3) Sputtering Target
Premium 99.99% pure Aluminum Oxide (Al2O3) sputtering target for thin film deposition applications. Available in various diameters and thicknesses, with optional copper backing for enhanced thermal conductivity. Ideal for research and industrial use in optics, electronics, and protective coatings.
Description
Premium 99.99% pure Aluminum Oxide (Al2O3) sputtering target for thin film deposition applications. Available in various diameters and thicknesses, with optional copper backing for enhanced thermal conductivity. Ideal for research and industrial use in optics, electronics, and protective coatings.
| Purity | Dimensions | Configuration | Packaging |
|---|---|---|---|
| 99.99% (4N) | ฯ50ร3mm | Standard | 1 pc per unit |
| 99.99% (4N) | ฯ50ร3mm | Bonded with 2mm copper backing | 1 pc per unit |
| 99.99% (4N) | ฯ50.8ร3mm | Standard | 1 pc per unit |
| 99.99% (4N) | ฯ50.8ร4mm | Standard | 1 pc per unit |
| 99.99% (4N) | 60ร3mm | Standard | 1 pc per unit |
| 99.99% (4N) | 60ร3mm | Bonded with 2mm copper backing | 1 pc per unit |
| 99.99% (4N) | ฯ60ร4mm | Standard | 1 pc per unit |
| 99.99% (4N) | ฯ76.2ร3mm | Standard | 1 pc per unit |
If you are interested or have any questions, please contact us at inquiry@atomfair.com
Disclaimer: Sold exclusively for laboratory research.
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