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Atomfair 4N High Purity Zirconium Oxide (ZrO2) Sputtering Target with 5.4% Yttrium Oxide (Y2O3) Doping – 3 mol%
This high-purity 99.99% (4N) zirconium oxide sputtering target is doped with 5.4% yttrium oxide (3 mol%) for enhanced stability and performance. Ideal for thin film deposition applications in semiconductor and optical coatings. Available in various diameters with optional copper backing for improved heat dissipation.
Description
This high-purity 99.99% (4N) zirconium oxide sputtering target is doped with 5.4% yttrium oxide (3 mol%) for enhanced stability and performance. Ideal for thin film deposition applications in semiconductor and optical coatings. Available in various diameters with optional copper backing for improved heat dissipation.
| Configuration | Diameter (mm) | Thickness (mm) | Backing | Packing |
|---|---|---|---|---|
| ZrO2 + 5.4% Y2O3 | 50.8 | 3 | None | 1 pc per pack |
| ZrO2 + 5.4% Y2O3 | 50.8 | 3 | 2mm Copper | 1 pc per pack |
| ZrO2 + 5.4% Y2O3 | 60 | 3 | None | 1 pc per pack |
| ZrO2 + 5.4% Y2O3 | 60 | 3 | 2mm Copper | 1 pc per pack |
| ZrO2 + 5.4% Y2O3 | 76.2 | 3 | None | 1 pc per pack |
| ZrO2 + 5.4% Y2O3 | 76.2 | 3 | 2mm Copper | 1 pc per pack |
If you are interested or have any questions, please contact us at inquiry@atomfair.com
Disclaimer: Sold exclusively for laboratory research.
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