Deposition & Thin-Film Materials
Showing 193–208 of 384 results
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Atomfair High Purity Lithium Tantalate (LiTaO3) Sputtering Target 4N (99.9%) – Various Sizes with Optional Copper Backing
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Atomfair High Purity Lithium Titanate (LiTiO3) Sputtering Target 99.9% (4N)
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Atomfair High Purity Magnesium Oxide (MgO) Crystalline & Sintered Granules – 4N/5N Grade
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Atomfair High Purity Manganese (Mn) Sputtering Target 99.7% – Various Sizes
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Atomfair High Purity Manganese Cobalt Nickel Alloy Sputtering Target (MnCoNi, 99.5%)
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Atomfair High Purity Manganese Powder (99.8%) – 300 Mesh & 500 Mesh
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Atomfair High Purity Manganese Rod (Mn) 99.7% – 12mm Diameter x 50mm Length
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Atomfair High Purity Manganese-Aluminum Alloy Sputtering Target (AlMn 90/10 wt%, 99.5% purity)
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Atomfair High Purity Molybdenum (Mo) Crucible for High-Temperature Applications
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Atomfair High Purity Molybdenum (Mo) Powder, 99.95% (4N), 2-3 Micron Particle Size
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Atomfair High Purity Molybdenum Boat (Type 310, V-Shaped Bottom) – 0.3mm Thickness
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Atomfair High Purity Molybdenum Carbide (Mo2C) Sputtering Target 99.5%
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Atomfair High Purity Molybdenum Disulfide (MoS2) Sputtering Target 99.9% (4N)
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Atomfair High Purity Molybdenum Rod (4N, 99.95%) – Precision Machined
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Atomfair High Purity Molybdenum Trioxide (MoO3) Sputtering Target – 99.9% (3N) Pure
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Atomfair High Purity Neodymium Praseodymium Alloy (NdPr) Lump – 80/20 at% Ratio