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Atomfair Zirconium(IV) hexafluoroacetylacetonate Zr(hfac)4 C20H8F24O8Zr CAS 19530-02-0
Zirconium(IV) hexafluoroacetylacetonate (CAS: 19530-02-0) is a high-purity organometallic compound with the molecular formula C20H8F24O8Zr . This advanced chemical reagent is widely utilized in materials science, catalysis, and thin-film deposition processes. Its unique hexafluoroacetylacetonate (hfac) ligands enhance volatility and thermal stability, making it ideal for Chemical Vapor Deposition (CVD) and Atomic Layer Deposition (ALD) applications. Suitable for research and industrial use, this product is rigorously tested to ensure superior quality, consistency, and performance in demanding environments.
Description
Zirconium(IV) hexafluoroacetylacetonate (CAS: 19530-02-0) is a high-purity organometallic compound with the molecular formula C20H8F24O8Zr. This advanced chemical reagent is widely utilized in materials science, catalysis, and thin-film deposition processes. Its unique hexafluoroacetylacetonate (hfac) ligands enhance volatility and thermal stability, making it ideal for Chemical Vapor Deposition (CVD) and Atomic Layer Deposition (ALD) applications. Suitable for research and industrial use, this product is rigorously tested to ensure superior quality, consistency, and performance in demanding environments.
Properties
- CAS Number: 19530-02-0
- Complexity: 1150
- IUPAC Name: (Z)-1,1,1,5,5,5-hexafluoro-4-hydroxy-pent-3-en-2-one;zirconium
- InChI: InChI=1S/4C5H2F6O2.Zr/c4*6-4(7,8)2(12)1-3(13)5(9,10)11;/h4*1,12H;/b4*2-1-;
- InChI Key: CCWHHGRRFFBJHC-ZVXPXTILSA-N
- Exact Mass: 921.888292
- Molecular Formula: C20H8F24O8Zr
- Molecular Weight: 923.5
- SMILES: C(=C(O)/C(F)(F)F)C(=O)C(F)(F)F.C(=C(O)/C(F)(F)F)C(=O)C(F)(F)F.C(=C(O)/C(F)(F)F)C(=O)C(F)(F)F.C(=C(O)/C(F)(F)F)C(=O)C(F)(F)F.[Zr]
- Topological: 149
- Monoisotopic Mass: 921.888292
- Synonyms: ZIRCONIUM(IV) HEXAFLUOROACETYLACETONATE, 19530-02-0, ZIRCONIUM(IV) HEXAFLUORO-2,4-PENTANEDIONATE, MFCD00079660, (Z)-1,1,1,5,5,5-hexafluoro-4-hydroxypent-3-en-2-one;zirconium
Zirconium(IV) hexafluoroacetylacetonate is primarily used as a precursor for depositing zirconium-containing thin films in semiconductor and nanotechnology applications. Its high volatility and stability make it suitable for CVD and ALD processes to create uniform, high-performance coatings. Researchers also employ it in catalytic systems and advanced material synthesis due to its well-defined reactivity. Additionally, it serves as a key intermediate in organometallic chemistry studies.
Safety and Hazards
GHS Hazard Statements
- H315 (100%): Causes skin irritation [Warning Skin corrosion/irritation]
- H319 (100%): Causes serious eye irritation [Warning Serious eye damage/eye irritation]
- H335 (100%): May cause respiratory irritation [Warning Specific target organ toxicity, single exposure; Respiratory tract irritation]
Precautionary Statements
- P261, P264, P264+P265, P271, P280, P302+P352, P304+P340, P305+P351+P338, P319, P321, P332+P317, P337+P317, P362+P364, P403+P233, P405, and P501
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Disclaimer: Sold exclusively for laboratory research. Prohibited for commercial use, diagnostics, or human/animal applications. Buyers assume all compliance liability.
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