Description

Zirconium, tetrakis(dimethylamino)- (CAS No. 19756-04-8) is a highly specialized organometallic compound with the molecular formula C₈H₂₄N₄Zr. This advanced chemical reagent is classified as a zirconium(4+) dimethylazanide complex, widely recognized for its role in materials science and thin-film deposition processes. With a purity grade tailored for research and industrial applications, this compound serves as a critical precursor in atomic layer deposition (ALD) and chemical vapor deposition (CVD) techniques. Its exceptional thermal stability and reactivity make it ideal for synthesizing high-performance zirconium-containing thin films, coatings, and nanomaterials. Packaged under inert gas to ensure stability, this product is rigorously tested for consistency and performance.

Properties

• CAS Number: 19756-04-8
• Complexity: 24.1
• IUPAC Name: dimethylazanide;zirconium(4+)
• InChI: InChI=1S/4C2H6N.Zr/c4*1-3-2;/h4*1-2H3;/q4*-1;+4
• InChI Key: DWCMDRNGBIZOQL-UHFFFAOYSA-N
• Exact Mass: 266.104796
• Molecular Formula: C8H24N4Zr
• Molecular Weight: 267.53
• SMILES: C[N-]C.C[N-]C.C[N-]C.C[N-]C.[Zr+4]
• Topological: 4
• Monoisotopic Mass: 266.104796
• Synonyms: 19756-04-8, Tetrakis(dimethylamido)zirconium(IV), Zirconium, tetrakis(dimethylamino)-, DTXSID90173439, DTXCID8095930, 629-068-5, TETRAKIS(DIMETHYLAMINO)ZIRCONIUM, TDMAZ, Tetrakis(dimethylamino)zirconium(IV), 17828-33-0, dimethylazanide;zirconium(4+), TDMAZ: Zr[N(CH3)2]4, MFCD00239502, Zr(NMe2)4, SCHEMBL77142, DB-009834, CS-0099001, Tetrakis(dimethylamido)zirconium(IV), crystalline, Tetrakis(dimethylamido)zirconium(IV), deposition grade, Tetrakis(dimethylamido)zirconium(IV), packaged for use in deposition systems, Tetrakis(dimethylamido)zirconium(IV), electronic grade, >=99.99% trace metals basis, Tetrakis(dimethylamino)Zirconium(IV), 98% (99.99%-Zr) TDMAZ, contained in 50ml Swagelok? cylinder for CVD/ALD

Application

Zirconium, tetrakis(dimethylamino)- is primarily used as a precursor for depositing zirconium oxide (ZrO₂) thin films in semiconductor and optoelectronic applications. Its high volatility and clean decomposition properties make it suitable for ALD and CVD processes in microelectronics manufacturing. Researchers also utilize this compound to develop advanced ceramic materials and catalysts due to its well-defined coordination chemistry.

Safety and Hazards

GHS Hazard Statements

• H228 (100%): Flammable solid [Danger Flammable solids]
• H261 (100%): In contact with water releases flammable gas [Danger Substances and mixtures which in contact with water, emit flammable gases]
• H315 (97.6%): Causes skin irritation [Warning Skin corrosion/irritation]
• H319 (97.6%): Causes serious eye irritation [Warning Serious eye damage/eye irritation]
• H335 (97.6%): May cause respiratory irritation [Warning Specific target organ toxicity, single exposure; Respiratory tract irritation]

Precautionary Statements

• P210, P231+P232, P240, P241, P261, P264, P264+P265, P271, P280, P302+P352, P304+P340, P305+P351+P338, P319, P321, P332+P317, P337+P317, P362+P364, P370+P378, P402+P404, P403+P233, P405, and P501

Hazard Classes and Categories

• Flam. Sol. 1 (100%)
• Water-react. 2 (100%)
• Skin Irrit. 2 (97.6%)
• Eye Irrit. 2 (97.6%)
• STOT SE 3 (97.6%)

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Disclaimer: Sold exclusively for laboratory research. Prohibited for commercial use, diagnostics, or human/animal applications. Buyers assume all compliance liability.