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Atomfair Triphenylsulfonium salicylate C25H20O3S
Description Triphenylsulfonium salicylate (CAS No. 345580-99-6) is a high-purity sulfonium salt with the molecular formula C25H20O3S . This compound, also known by its IUPAC name 2-carboxyphenolate;triphenylsulfanium , is a versatile reagent widely used in photopolymerization, catalysis, and advanced material synthesis. Its unique structure combines a triphenylsulfonium cation with a salicylate anion, offering excellent solubility in organic solvents and thermal stability up to 200??C. Triphenylsulfonium salicylate is particularly valued in photoresist formulations for semiconductor manufacturing due to its efficient photoacid generation (PAG) properties. Available in 98%+ purity, this product is supplied as a white to off-white crystalline powder with strict quality…
Description
Description
Triphenylsulfonium salicylate (CAS No. 345580-99-6) is a high-purity sulfonium salt with the molecular formula C25H20O3S. This compound, also known by its IUPAC name 2-carboxyphenolate;triphenylsulfanium, is a versatile reagent widely used in photopolymerization, catalysis, and advanced material synthesis. Its unique structure combines a triphenylsulfonium cation with a salicylate anion, offering excellent solubility in organic solvents and thermal stability up to 200??C. Triphenylsulfonium salicylate is particularly valued in photoresist formulations for semiconductor manufacturing due to its efficient photoacid generation (PAG) properties. Available in 98%+ purity, this product is supplied as a white to off-white crystalline powder with strict quality control to ensure batch-to-batch consistency for research and industrial applications.
- CAS No: 345580-99-6
- Molecular Formula: C25H20O3S
- Molecular Weight: 400.5
- Exact Mass: 400.11331567
- Monoisotopic Mass: 400.11331567
- IUPAC Name: 2-carboxyphenolate;triphenylsulfanium
- SMILES: C1=CC=C(C=C1)[S+](C2=CC=CC=C2)C3=CC=CC=C3.C1=CC=C(C(=C1)C(=O)O)[O-]
- Synonyms: 345580-99-6, triphenylsulfonium salicylate, 962-446-0, Triphenylsulfonium 2-hydroxybenzoate, SCHEMBL109218
Application
Triphenylsulfonium salicylate is primarily used as a photoacid generator (PAG) in chemically amplified photoresists for deep UV and electron beam lithography in semiconductor fabrication. It also serves as a catalyst in cationic polymerization reactions for epoxy resins and other thermosetting polymers. Researchers utilize this compound in the development of advanced polymeric materials and as a precursor for sulfonium-based ionic liquids.
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