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Atomfair Tetrakis(ethylmethylamido)titanium(IV) C12H32N4Ti CAS 308103-54-0
Tetrakis(ethylmethylamido)titanium(IV) (CAS: 308103-54-0) is a highly specialized organometallic compound with the molecular formula C12H32N4Ti . This titanium-based precursor is widely utilized in advanced materials science, particularly in chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes for the fabrication of high-purity titanium nitride (TiN) and titanium oxide (TiO2) thin films. Its volatile nature and excellent thermal stability make it an ideal choice for precision coatings in semiconductor manufacturing, optoelectronics, and nanotechnology applications. The compound is rigorously synthesized and purified to ensure ultra-high purity (>99.9%), minimizing contaminants that could compromise film quality. Proper handling under inert atmospheres (e.g., argon or…
Description
Tetrakis(ethylmethylamido)titanium(IV) (CAS: 308103-54-0) is a highly specialized organometallic compound with the molecular formula C12H32N4Ti. This titanium-based precursor is widely utilized in advanced materials science, particularly in chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes for the fabrication of high-purity titanium nitride (TiN) and titanium oxide (TiO2) thin films. Its volatile nature and excellent thermal stability make it an ideal choice for precision coatings in semiconductor manufacturing, optoelectronics, and nanotechnology applications. The compound is rigorously synthesized and purified to ensure ultra-high purity (>99.9%), minimizing contaminants that could compromise film quality. Proper handling under inert atmospheres (e.g., argon or nitrogen) is essential due to its sensitivity to moisture and air.
Properties
- CAS Number: 308103-54-0
- Complexity: 50.5
- IUPAC Name: ethyl(methyl)azanide;titanium(4+)
- InChI: InChI=1S/4C3H8N.Ti/c4*1-3-4-2;/h4*3H2,1-2H3;/q4*-1;+4
- InChI Key: LNKYFCABELSPAN-UHFFFAOYSA-N
- Exact Mass: 280.2106377
- Molecular Formula: C12H32N4Ti
- Molecular Weight: 280.28
- SMILES: CC[N-]C.CC[N-]C.CC[N-]C.CC[N-]C.[Ti+4]
- Topological: 4
- Monoisotopic Mass: 280.2106377
- Synonyms: 308103-54-0, Tetrakis(ethylmethylamido)titanium(IV), DTXSID10403326, DTXCID90354180, 628-239-1, TETRAKIS(ETHYLMETHYLAMINO)TITANIUM, 175923-03-2, ethyl(methyl)azanide;titanium(4+), SCHEMBL135622, MFCD00799591, DB-009837, CS-0111522, Tetrakis(ethylmethylamido)titanium(IV), electronic grade, >=99.99%
Application
Tetrakis(ethylmethylamido)titanium(IV) is primarily employed as a precursor for depositing titanium-containing thin films via ALD/CVD in semiconductor devices, such as gate dielectrics and diffusion barriers. It also finds use in photovoltaic cells and optical coatings due to its ability to form uniform, conformal layers. Researchers leverage its reactivity to develop advanced catalytic systems and nanostructured materials.
Safety and Hazards
GHS Hazard Statements
- H225 (100%): Highly Flammable liquid and vapor [Danger Flammable liquids]
- H260 (100%): In contact with water releases flammable gases which may ignite spontaneously [Danger Substances and mixtures which in contact with water, emit flammable gases]
- H314 (100%): Causes severe skin burns and eye damage [Danger Skin corrosion/irritation]
Precautionary Statements
- P210, P223, P231+P232, P233, P240, P241, P242, P243, P260, P264, P280, P301+P330+P331, P302+P335+P334, P302+P361+P354, P303+P361+P353, P304+P340, P305+P354+P338, P316, P321, P363, P370+P378, P402+P404, P403+P235, P405, and P501
Hazard Classes and Categories
- Flam. Liq. 2 (100%)
- Water-react. 1 (100%)
- Skin Corr. 1B (100%)
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