Atomfair Sulfonium, triphenyl-, 1,1,1-trifluoromethanesulfonate (1:1) TPST C19H15F3O3S2 CAS 66003-78-9

Description

Triphenylsulfonium Triflate (TPST) is a high-purity sulfonium salt widely used as a photoacid generator (PAG) in advanced photoresist formulations for semiconductor lithography, UV-curable coatings, and other radiation-sensitive applications. This compound, with the molecular formula C₁₉H₁₅F₃O₃S₂ (CAS No. 66003-78-9), exhibits excellent thermal stability and solubility in organic solvents, making it ideal for deep-UV (DUV), extreme-UV (EUV), and electron beam lithography processes. Triphenylsulfonium Triflate decomposes upon exposure to UV light, releasing strong acid species that catalyze polymer crosslinking or deprotection reactions in chemically amplified resists. Our product is rigorously tested for purity (>98%) and low metallic impurities (<1 ppm) to ensure consistent performance in microelectronics fabrication. Supplied as a crystalline solid under inert packaging to prevent moisture absorption.

Properties

• CAS Number: 66003-78-9
• Complexity: 346
• IUPAC Name: trifluoromethanesulfonate;triphenylsulfonium
• InChI: InChI=1S/C18H15S.CHF3O3S/c1-4-10-16(11-5-1)19(17-12-6-2-7-13-17)18-14-8-3-9-15-18;2-1(3,4)8(5,6)7/h1-15H;(H,5,6,7)/q+1;/p-1
• InChI Key: FAYMLNNRGCYLSR-UHFFFAOYSA-M
• Exact Mass: 412.04147117
• Molecular Formula: C19H15F3O3S2
• Molecular Weight: 412.4
• SMILES: C1=CC=C(C=C1)[S+](C2=CC=CC=C2)C3=CC=CC=C3.C(F)(F)(F)S(=O)(=O)[O-]
• Topological: 66.6
• Monoisotopic Mass: 412.04147117
• Synonyms: 66003-78-9, Triphenylsulfonium triflate, DTXSID60886569, Sulfonium, triphenyl-, 1,1,1-trifluoromethanesulfonate (1:1), Sulfonium, triphenyl-, salt with trifluoromethanesulfonic acid (1:1), DTXCID201025893, 627-353-9, Triphenylsulfonium trifluoromethanesulfonate, Triphenylsulphonium triflate, triphenyl sulfonium triflate, TPST, trifluoromethanesulfonate;triphenylsulfanium, 220122-79-2, trifluoromethanesulfonate; triphenylsulfonium, MFCD01940916, TRIPHENYLSULFONIUMTRIFLUOROMETHANESULFONATE, SCHEMBL37032, C19H15F3O3S2, BCP31331, AKOS025310433, AS-79081, DB-054857, Triphenylsulfonium trifluoromethane sulfonate, T2180, E78305, Q7843283, Triphenylsulfonium trifluoromethanesulfonate;Sulfonium, triphenyl-, 1,1,1-trifluoromethanesulfonate

Triphenylsulfonium Triflate is a key photoacid generator (PAG) in semiconductor photolithography, enabling high-resolution patterning for advanced IC manufacturing. It is used in chemically amplified resists (CARs) for DUV and EUV lithography due to its efficient acid generation and compatibility with resist polymers. This compound also finds applications in UV-curable coatings, printed circuit board (PCB) fabrication, and advanced material synthesis where controlled acid catalysis is required.

Safety and Hazards

GHS Hazard Statements

• H315 (100%): Causes skin irritation [Warning Skin corrosion/irritation]
• H319 (100%): Causes serious eye irritation [Warning Serious eye damage/eye irritation]

Precautionary Statements

• P264, P264+P265, P280, P302+P352, P305+P351+P338, P321, P332+P317, P337+P317, and P362+P364

Hazard Classes and Categories

• Acute Tox. 3 (58.9%)
• Skin Irrit. 2 (98.9%)
• Eye Irrit. 2 (98.9%)
• STOT SE 3 (41.1%)

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Disclaimer: Sold exclusively for laboratory research. Prohibited for commercial use, diagnostics, or human/animal applications. Buyers assume all compliance liability.