Description

Silicon Tetrafluoride (SiF₄) is a high-purity inorganic compound widely utilized in research and industrial applications. This colorless, non-flammable gas exhibits a pungent odor and is highly reactive with water, making it essential for specialized chemical synthesis and material processing. With a molecular formula of F₄Si and CAS number 7783-61-1, it is rigorously manufactured to meet stringent purity standards, ensuring consistency for advanced scientific applications. Silicon Tetrafluoride is commonly employed in semiconductor manufacturing, optical fiber production, and as a precursor for silicon-based thin films. Packaged in secure, corrosion-resistant cylinders to maintain integrity, this product is ideal for laboratories and industrial settings requiring precise fluorination or silicon deposition processes.

Properties

• CAS Number: 7783-61-1
• Complexity: 19.1
• IUPAC Name: tetrafluorosilane
• InChI: InChI=1S/F4Si/c1-5(2,3)4
• InChI Key: ABTOQLMXBSRXSM-UHFFFAOYSA-N
• Exact Mass: 103.97053918
• Molecular Formula: F4Si
• Molecular Weight: 104.079
• SMILES: F[Si](F)(F)F
• Monoisotopic Mass: 103.97053918
• Physical Description: Silicon tetrafluoride appears as a colorless, nonflammable, corrosive and toxic gas with a pungent odor similar to that of hydrochloric acid. Very toxic by inhalation. Vapor is heavier than air. Under prolonged exposure to heat the containers may rupture violently and rocket.
• Color/Form: COLORLESS GAS
• Odor: VERY PUNGENT ODOR SIMILAR TO THAT OF HYDROGEN CHLORIDE
• Boiling Point: -86 °C
• Melting Point: -90.2 °C
• Solubility: SOL IN ABSOLUTE ALCOHOL; SOL IN HYDROGEN FLUORIDE; INSOL IN ETHER
• Density: 0.00469 g/cu-cm ; 1.598 g/cu-cm ; 2.145 g/cu-cm
• Vapor Density: 3.57 @ 15 °C
• Stability/Shelf Life: FUMES STRONGLY IN AIR
• Synonyms: Tetrafluorosilane, SILICON TETRAFLUORIDE, Perfluorosilane, Silicon fluoride (SiF4), SiF4, UN1859, HSDB 684, UNII-K60VCI56YO, EINECS 232-015-5, K60VCI56YO, Silicon tetrafluoride, compressed, UN-1859, 232-015-5, Silane, tetrafluoro-, 7783-61-1, Silicon fluoride, SCHEMBL42198, DTXSID0064830, ABTOQLMXBSRXSM-UHFFFAOYSA-, SILICON TETRAFLUORIDE [MI], MFCD00040533, InChI=1/F4Si/c1-5(2,3)4, UN 1859, DB-256073, Q413140, Silicon tetrafluoride, electronic grade, >=99.99%, Silicon tetrafluoride, compressed [UN1859] [Poison gas]

Application

Silicon Tetrafluoride is primarily used in the production of high-purity silicon and silicon dioxide for semiconductor and photovoltaic applications. It serves as a key etching agent in microelectronics and as a precursor for chemical vapor deposition (CVD) of silicon-containing films. Additionally, SiF₄ is employed in the synthesis of fluorosilicic acid and specialty glass coatings.

Safety and Hazards

GHS Hazard Statements

• H280: Contains gas under pressure; may explode if heated [Warning Gases under pressure]

Precautionary Statements

• P410+P40, and 410+P403

Hazard Classes and Categories

• Press. Gas (58.6%)
• Acute Tox. 2 (24.8%)
• Acute Tox. 1 (24.8%)
• Skin Corr. 1B (100%)
• Acute Tox. 2 (82.8%)
• Acute Tox. 3 (17.2%)

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Disclaimer: Sold exclusively for laboratory research. Prohibited for commercial use, diagnostics, or human/animal applications. Buyers assume all compliance liability.