Description
Silicic acid (H4SiO4), tetrakis(2,2,2-trifluoroethyl) ester (CAS No. 338-39-6) is a highly specialized fluorinated silicon compound with the molecular formula C8H8F12O4Si. Also known as tetrakis(2,2,2-trifluoroethyl) silicate, this organosilicon reagent features four trifluoroethyl groups bound to a central silicon atom, delivering unique reactivity and stability in synthetic applications. Its high fluorine content and steric shielding make it valuable for advanced material science, surface modification, and as a precursor for fluorinated coatings or polymers. The compound is supplied as a high-purity liquid (or solid, depending on storage conditions) and should be handled under inert conditions due to potential moisture sensitivity. Researchers utilize this chemical for its ability to introduce both silicon and fluorine functionalities in a single step, enabling the synthesis of novel hybrid materials with tailored properties such as hydrophobicity, chemical resistance, or low surface energy.
Properties
- CAS Number: 338-39-6
- Complexity: 322
- IUPAC Name: tetrakis(2,2,2-trifluoroethyl) silicate
- InChI: InChI=1S/C8H8F12O4Si/c9-5(10,11)1-21-25(22-2-6(12,13)14,23-3-7(15,16)17)24-4-8(18,19)20/h1-4H2
- InChI Key: MRBWGPMSUYEXDQ-UHFFFAOYSA-N
- Exact Mass: 424.0000232
- Molecular Formula: C8H8F12O4Si
- Molecular Weight: 424.21
- SMILES: C(C(F)(F)F)O[Si](OCC(F)(F)F)(OCC(F)(F)F)OCC(F)(F)F
- Topological: 36.9
- Monoisotopic Mass: 424.0000232
- Synonyms: 338-39-6, Silicic acid (H4SiO4), tetrakis(2,2,2-trifluoroethyl) ester, Ethanol, 2,2,2-trifluoro-, tetraester with silicic acid (H4SiO4), Tetrakis(2,2,2-trifluoroethoxy)silane, tetrakis(2,2,2-trifluoroethyl) orthosilicate, tetra(trifluoroethoxy)silane, SCHEMBL996574, DTXSID70955376, MRBWGPMSUYEXDQ-UHFFFAOYSA-N
Application
This fluorinated silicate ester is primarily employed as a precursor for synthesizing fluorine-doped silicon-based materials, including hydrophobic coatings and low-k dielectrics. It serves as a key reagent in sol-gel processes to create hybrid organic-inorganic frameworks with enhanced thermal and chemical stability. Applications extend to surface modification of nanoparticles and fabrication of anti-reflective or anti-fouling coatings in optical and marine industries.
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