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Atomfair Photomask
High-precision photomasks for laboratory use with customizable designs. Features extremely fine patterns with minimum line width of 0.015mm .
Description
Research-grade photomasks with ultra-high resolution capabilities for laboratory applications. Our precision photomasks support advanced microfabrication with exceptional pattern fidelity down to 15ฮผm feature sizes.
| Technical Specification | Performance Value |
|---|---|
| Minimum Resolvable Feature | 15ฮผm (0.015mm) |
| Minimum Aperture Size | 20ฮผm (0.020mm) |
| Pattern Placement Accuracy | ยฑ1ฮผm |
| Substrate Options | Soda-lime glass, Quartz |
| Custom Design Service | 3-5 business day turnaround |
Design Specifications
- Accepts GDSII, DXF, and DWG file formats
- Minimum feature spacing: 10ฮผm
- Maximum design area: 150ร150mm
For custom photomask design consultation or technical support, contact our lithography specialists at inquiry@atomfair.com
Research Application Note: These high-precision photomasks are manufactured for research purposes in micro/nanofabrication and MEMS development. Not intended for industrial production use.
