Description

Nitrogen Trifluoride (NF₃) is a highly reactive inorganic compound with the molecular formula F₃N. This colorless, nonflammable gas is characterized by its strong oxidizing properties and is widely used in specialized industrial applications. With a CAS number of 7783-54-2, Nitrogen Trifluoride is manufactured to the highest purity standards, ensuring optimal performance in semiconductor and electronics manufacturing. Its stability under normal conditions makes it a reliable choice for precision processes, though it requires careful handling due to its reactivity with reducing agents. Packaged in high-quality, certified cylinders, our NF₃ is ideal for demanding research and production environments.

Properties

• CAS Number: 7783-54-2
• Complexity: 8
• IUPAC Name: trifluoroamine
• InChI: InChI=1S/F3N/c1-4(2)3
• InChI Key: GVGCUCJTUSOZKP-UHFFFAOYSA-N
• Exact Mass: 70.99828349
• Molecular Formula: F3N
• Molecular Weight: 71.002
• SMILES: N(F)(F)F
• Topological: 3.2
• Monoisotopic Mass: 70.99828349
• Physical Description: Nitrogen trifluoride appears as a colorless gas with a moldy odor. Very toxic by inhalation. Slightly soluble in water. Corrosive to tissue. Under prolonged exposure to fire or heat the containers may rupture violently and rocket. Used to make other chemicals and as a component of rocket fuels.
• Color/Form: Colorless gas [Note: Shipped as a nonliquified compressed gas]
• Odor: Moldy odor
• Boiling Point: -200 °F at 760 mmHg
• Melting Point: -340 °F
• Solubility: Slight
• Density: 2.902 g/L
• Vapor Density: 2.46 – Heavier than air; will sink
• Vapor Pressure: greater than 1 atm
• Heat of Vaporization: 11.56 kJ/mol at -128.75 °C
• Ionization Potential: 12.97 eV
• Refractive Index: Refractive Index determined in the gaseous state = 1.0004
• Synonyms: NITROGEN TRIFLUORIDE, Trifluoroamine, Nitrogen fluoride, Trifluoroammonia, 7783-54-2, Perfluoroammonia, trifluoroazane, UN2451, HSDB 1113, trifluoridonitrogen, EINECS 232-007-1, UNII-4402F4X0RH, Nitrogen trifluoride, compressed, 4402F4X0RH, DTXSID4040181, CHEBI:30231, EC 232-007-1, UN-2451, Trifluoramine, Trifluorammonia, NF3, (NF3), [NF3], NF(3) gas, DTXCID2020181, 232-007-1, nitrogen trifluoride (acgih:osha), Nitrogen fluoride (NF3), N,N,N-Trifluoroamine #, Nitrogen trifluoride 99%, SCHEMBL36079, NITROGEN FLUORIDE [MI], SCHEMBL2994431, MFCD00042549, UN 2451, NS00043980, Q413835, Nitrogen trifluoride, compressed [UN2451] [Nonflammable gas]

Application

Nitrogen Trifluoride is primarily used as a fluorine source in plasma etching and cleaning of chemical vapor deposition (CVD) chambers in the semiconductor industry. It is also employed in the production of flat-panel displays and microelectromechanical systems (MEMS) due to its ability to selectively remove silicon and silicon nitride. Additionally, NF₃ serves as a precursor in the synthesis of other fluorine-containing compounds, making it valuable in advanced material research.

Safety and Hazards

GHS Hazard Statements

• H270: May cause or intensify fire; oxidizer [Danger Oxidizing gases]
• H280: Contains gas under pressure; may explode if heated [Warning Gases under pressure]
• H332: Harmful if inhaled [Warning Acute toxicity, inhalation]
• H371: May cause damage to organs [Warning Specific target organ toxicity, single exposure]
• H373: May causes damage to organs through prolonged or repeated exposure [Warning Specific target organ toxicity, repeated exposure]

Precautionary Statements

• P220, P244, P260, P261, P264, P270, P271, P304+P340, P308+P316, P317, P319, P370+P376, P403, P405, P410+P403, and P501

Hazard Classes and Categories

• Oxidizing gases – Category 1
• Gases under pressure – High pressure liquefied gas
• Acute toxicity – Category 4
• Specific target organ toxicity – Single exposure – Category 2
• Specific target organ toxicity – Repeated exposure – Category 2

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Disclaimer: Sold exclusively for laboratory research. Prohibited for commercial use, diagnostics, or human/animal applications. Buyers assume all compliance liability.