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Atomfair Laser Etching Processing
Precision laser etching service for FTO/ITO films with non-contact processing and high flexibility. Features minimal heat-affected zones and clean etching results, suitable for solar cells and semiconductor materials. Achieves 卤0.1mm alignment accuracy and >200M惟 resistance in etched areas.
Description
Advanced laser patterning service for transparent conductive oxides (TCO) films, offering non-contact precision processing with minimal thermal impact. Our laser etching technology delivers clean, high-resolution patterns for photovoltaic and semiconductor research applications.
| Technical Specification | Performance Value |
|---|---|
| Laser Spot Size | 10μm (0.01mm) |
| Alignment Accuracy | ±0.1mm |
| Insulation Resistance | >200MΩ |
| Processing Environment | Class 1000 Cleanroom |
| Maximum Substrate Size | 150×150mm |
Service Features
- Non-contact processing eliminates mechanical stress
- Heat-affected zone <20μm
- Precision edge definition (Ra <0.5μm)
- Pre-cleaning and vacuum packaging included
- Support for complex pattern designs
For design files submission (DXF/DWG formats) or technical consultation, contact our laser processing specialists at inquiry@atomfair.com
Research Application Note: This precision laser etching service is optimized for research and development of photovoltaic devices and semiconductor components. Process parameters may vary for production-scale applications.
