Atomfair High-Purity Titanium Nickel Silver Alloy Sputtering Target (TiNiAg, 70:20:10 at%, 99.9%)

High-purity Titanium Nickel Silver (TiNiAg) alloy sputtering target with a composition of Ti:Ni:Ag = 70:20:10 at%. Ideal for thin film deposition in research and industrial applications. Guaranteed 99.9% purity and precise dimensions for consistent performance.

Description

High-purity Titanium Nickel Silver (TiNiAg) alloy sputtering target with a composition of Ti:Ni:Ag = 70:20:10 at%. Ideal for thin film deposition in research and industrial applications. Guaranteed 99.9% purity and precise dimensions for consistent performance.

Product Name Composition Purity Dimensions Packaging Packaging Size
Titanium Nickel Silver Alloy Target Ti:Ni:Ag = 70:20:10 at% 99.9% ฯ†80 ร— 1.5mm Piece 1

If you are interested or have any questions, please contact us at inquiry@atomfair.com

Disclaimer: Sold exclusively for laboratory research.

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